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IEVref:523-05-15ID:
Language:enStatus: Standard
Term: atomic layer deposition
Synonym1: ALD
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Definition: thin film deposition technique at atomic-level resolution thickness

Note 1 to entry: By changing the precursor gases sequentially, a chemical deposition process can be controlled down to the atomic or molecular scale. In the molecular beam epitaxy process, one of the related techniques, the deposited layer has the same crystal structure as that of the mono-crystalline substrate.

Note 2 to entry: This note applies to the French language only.


Publication date:2018-12
Source:IEC 62047-1:2016, 2.5.32
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